JePPIX Course/Training on Photonic Integration Technology 2008
JePPIX Design and Technology
The third JePPIX training course ran from November 17th until November 27th 2008.
Venue - Technical University of Eindhoven
Course Outline:-
1st week: Design of Photonic Circuits (Led by Xaveer Leijtens from COBRA and Arjen Bakker from PhoeniX). The week's programme is split into lectures and practical training in the design software)
2nd week: Photonic Integration Technology (Led by Richard Nötzel and Fouad Karouta, both from COBRA).
The mornings will largely be reserved for lectures and the afternoons for training in the clean room and for practical studies on the software tools on the optical measurement of InP-based passive waveguides.
Details of the programme are given below:
Programme week 1: 17th - 21st November
Time: |
Monday: |
Tuesday: |
Wednesday: |
Thursday: |
Friday: |
Morning |
Introduction in PICs (MS) |
Multi-layer waveguides (XL) |
Junctions and Couplers (XL) |
SOAs: structures, basic properties, amplification and thermal issues (EB) |
Arrayed Waveguide Gratings (XL) |
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Wave Equation modes, bv-diagram (XL) |
Curved waveguides (XL) |
Mode Solvers (JB:PhoeniX) |
MMI couplers (XL) |
Mask Design (XL) |
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Three layer Waveguides (XL) |
Introduction to PhoeniX structure definition (AB:PhoeniX) |
Beam Propagation: BPM,FDTD |
Arrayed Waveguide Gratings (XL) |
SOAs: lasers and Signal Processing (EB) |
Afternoon |
Software installation and ADS Tutorial (XL) |
Tools, parameterized designs (AB: PhoeniX) |
Modesolvers and BPM (AB,JB: PhoeniX) |
ADS Assignments (1) (XL) |
ADS Assignments (2) (XL + Phoenix) and AWG simulation (RS) |
Programme week 2: 24th - 28th November
Time: |
Monday: |
Tuesday: |
Wednesday: |
Thursday: |
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Morning |
MOVPE, MBE and CBE basics (1) (RN) |
Optical characterization (RN) |
PECVD (FK) |
Process tolerances and device design (FK) |
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MOVPE, MBE and CBE basics (2) (RN) |
Regrowth technology (RN) |
RIE Metallisation (FK) |
Fabry-Perot/demo Mode Locked Laser (FK) |
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Structural and electrical characterization (RN) |
InAs/InP quantum dot laser (RN) |
Processing of WG-SOA (FK) |
Discussion and Evaluation Session |
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Afternoon |
Crystal Structure, Notions of Vacuum, Lithography/Processing Waveguides (FK) |
Clean room processing (1) (FK) |
Clean room processing (2) (FK) |
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